Laser technologies of microelectronics using the example of processing the most important electronics material, which remains silicon.
The advantages of laser technology become clear when new varieties are used, which involve fairly narrow “process windows” using complex nonlinear effects: the use of multiphoton absorption, filament, thermal spalling or “hidden” internal separation. These new technologies make it possible to dramatically reduce the size of defective zones, increase the quality of processing, while simultaneously reducing the width of the cut between chips (from 50–100 to 10–20 microns), which makes it possible to move to new architecture options or increase the density of chips on the wafer.
Another option for laser technology is through drilling holes in a silicon wafer (Silicon Through Via), as well as precision laser milling and the formation of complex structures. These capabilities are significant for modern 3D assembly and micromechanical device (MEMS) designs. Laser technology makes it possible to achieve high quality holes, as well as a high ratio of hole diameter to depth, has no analogues from mechanical operations and in many cases is an interesting alternative to plasma-chemical etching.
The high stability of the laser beam directly depends on the precise thermal stabilization of the light source.
A new thermoelectric thermal stabilizer for circulating fluid RRC-600-TE-LL is developed and manufactured by Crystal Ltd. company for the fast-growing market of micro processing equipment, in particular for tasks in the micro- and electronics industry.
The advanced solutions implemented in this device allow: